Method of forming a semiconductor structure

Details Method of forming a semiconductor structure Method of forming a semiconductor structure

1996-07-30

2001-12-04

Jackson, Jr., Jerome (Department: 2815)

Active solid-state devices (e.g., transistors, solid-state diode

Heterojunction device

Light responsive structure

C257S191000, C257S018000, C257S022000, C438S172000, C438S191000, C438S235000, C438S317000, C438S380000

Reexamination Certificate

active

06326650

ABSTRACT:

FIELD OF THE INVENTION
The present invention relates to a method of forming a semiconductor structure.
BACKGROUND
I. General
Pair-production by impact ionisation is one of the most important processes affecting the performance of semiconductor electronic devices. The secondary carriers lead to current multiplication which is used to increase the signal in avalanche photodiodes and phototransistors. However, avalanche breakdown imposes an upper limit on the bias that can be applied to semiconductor pn junctions, for example in diodes and transistors, which limits the power available from such devices.
In many cases it is desirable to control the likelihood of impact ionisation and avalanche breakdown by means of a suitable choice of semiconductor material, and/or by engineering the electric field profile by means of suitable doping with p- or n-type impurities. Additionally, the conduction band and valence band-structure may be tailored by means of compositional variation (i.e. alloying) or by growth of heterojunctions comprising layered materials of different band-structure. Lattice mismatched systems may be grown and the resulting strain used to modify the material properties.
The design of semiconductor structures with controlled ionisation or avalanche breakdown properties requires an understanding of the effects of the material properties on the ionisation coefficients. In particular, the energy band-structure is known to have a significant effect on impact ionisation (F. Capasso, Physics of Avalanche Photodiodes, Academic, San Diego, 1985). Many attempts have been made to design and engineer structures with artificially enhanced or suppressed ionisation coefficients, but these have been rather unsuccessful and considerable controversy remains concerning the validity of the experimental results.
The failure of these previous attempts has been due to an incorrect understanding of the effect of the band-structure on the ionisation rates and, hence, a use of incorrect or inaccurate prescriptions for the design of devices. As an example, we refer to the prescriptions given in Sze S.M. Physics of Semiconductor Devices 2nd Edition (Wiley, 1981) at page 104 for the breakdown voltage V
b
in abrupt p-n junctions and linearly graded junctions. These are reproduced below.
Abrupt junction:
V
b
=60(
E
g
/1.1)
3/2
(
N
B
/10
16
)
−3/4
  (1)
Linearly graded junction:
V
b
=60(
E
g
/1.1)
6/5
(
a
/3×10
20
)
−2/5
  (2)
The parameters E
g
, N
B
and a are the bandgap the background doping density and the doping gradient respectively. These prescriptions were based on the experimentally measured ionisation coefficients of Ge, Si, GaAs and GaP. A similar prescription has been calculated which applies to p-i-n diodes with a 1 &mgr;m thick i-layer:
V
b
=30(
E
g
/1.1)  (3)
Although, the apparent linear dependence of V
b
on the band-gap E
g
holds approximately for these materials, it has not been known whether the relation holds for other materials, or how accurate the expression is. Nevertheless, these prescriptions have been widely used and applied to many materials. Furthermore, the basic assumption contained in these formulae, viz. that it is the energy bandgap E
g
that primarily determines the ionisation coefficients, is the assumption common to apparently all the previous attempts to control and engineer ionisation coefficients.
Other simple theories of impact ionisation have expressed ionisation coefficients in terms of ionisation threshold energies, phonon energies, and the electron-phonon scattering mean-free path, with the latter two variables treated as parameters which are varied to fit experimental data for the ionisation coefficients [for a detailed review, see F. Capasso, in Semiconductors and Semimetals (ed. W. T. Tsang, Academic, New York) 22D (1986) 1]. Hence these theories have no predictive power in respect of the ionisation characteristics of different materials.
Recently, considerable progress has been made in the first-principles numerical calculation of ionisation coefficients, incorporating the effects of the full bandstructure on the carrier kinematics [Shichijo and Hess, Phys. Rev. B 23, p.4197, 1981], scattering dynamics [M. V. Fischetti and S. E. Laux, Phys. Rev. B38, 9721 (1988)] and impact ionisation cross-section [N. Sano and A. Yoshii, Phys. Rev. B45 (1992) 4171; J. Bude and K. Hess, J. Appl. Phys. 72 (1992) 3554, Y. Kamakura, H. Mizuno, M. Yamaji, M. Morifuji, K. Taniguchi, C. Hamaguchi, T. Kunikiyo, M. Takenaka, J. Appl. Phys. 75 (1994) 3500]. However, few materials have been studied to date. Due to the numerical complexity, no simple relation between the ionisation coefficients or breakdown voltage and energy bandstructure has been expected. Selection of semiconductor materials with desired breakdown properties has therefore been made based on empirical knowledge of the ionisation rates in each material.
Optimisation of semiconductor device performance may impose apparently contradictory requirements on the properties of the constituent materials. For example, high speed operation of a field-effect transistor (FET) requires a material with high transient electron velocity (implying a low electron effective mass and hence narrow bandgap), whereas high power operation requires a high breakdown voltage (previously thought to imply a material with wide bandgap). Similarly, a photodetector for use in the near infra-red wavelength region conventionally requires a material with a narrow direct bandgap, whereas the requirements of low dark current suggest the use of a material with a wide bandgap to reduce both primary generation of dark current and its subsequent multiplication by impact ionisation. Some of these trade-offs have in the past been addressed by using composite structures, in which layers of different material composition perform different functions.
The effect of impact ionisation and breakdown, and hence the ionisation properties desired, are different for different classes of device. Here we summarise design optimisation problems in respect of these properties in Field-Effect Transistors (FETs), bipolar transistors, avalanche photodiodes (APDs) and Impact ionisation Avalanche Transit Time (IMPATT) diodes.
II. Specific Semiconductor Device Design Problems FETs
High-speed FET operation requires a material in which carriers have a high effective velocity, and whose transport can be efficiently modulated by the gate. This generally implies a material with a narrow energy bandgap. However, high-power operation requires a high avalanche breakdown voltage which previously has been identified with a wide bandgap.
Known ultra-short gate length FETs have cut-off frequencies well above 100 GHz. Many microwave and millimetre-wave applications in optical communications, for example laser drivers and photoreceiver amplifiers, and radio, for example oscillators and low-noise amplifiers, require high-speed devices capable of handling large currents and voltages.
The highest operation frequencies have been obtained in AlInAs/GaInAs high electron mobility transistors (HEMTs). However, the narrow bandgap of InGaAs and the consequent high probability of impact ionisation and Zener tunnelling leads to several problems, including low source-drain breakdown voltage and the presence of “kink” phenomena.
The output power of FETs with GaAs and InGaAs channels is limited by avalanche breakdown. In order to increase the power, heterojunction FETs with doped InP channels have been fabricated. [D. R. Greenberg, J. A. del Alamo & R. Bhat IEEE Trans. Electron Devices, ED 42 1574(1995)]. The smaller ionisation probability of InP, compared with GaAs or InGaAs, leads to increased breakdown voltage and hence voltage swing. A complete absence of ionisation in the channel has been achieved hitherto, with consequently low gate current and low output conductance. However, the cut-off frequency was reduced due to the lower mobility of InP and to the doping in the channel.
T

Affiliated with

Also associated with

Rating

Method of forming a semiconductor structure does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Method of forming a semiconductor structure, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Method of forming a semiconductor structure will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-2560945