Method of forming a precisely spaced stack of substrate layers

Details Method of forming a precisely spaced stack of substrate layers Method of forming a precisely spaced stack of substrate layers

1991-11-22

1993-05-11

Weston, Caleb

Adhesive bonding and miscellaneous chemical manufacture

Methods

Surface bonding and/or assembly therefor

156 89, 156325, 264 58, B32B 1800, B32B 3106

Patent

active

052097986

ABSTRACT:
A precisely spaced stack of substrate layers comprises a plurality of substrate layers disposed one above another in a stacked configuration and having a glass layer coating on one of each pair of adjacent substrates, the glass layer having a thickness such that the sum of the thicknesses of the glass layer and the substrate to which the glass layer is fused is approximately equal for substantially all of the substrate layers. A polymer adhesive is disposed intermediate the glass layer and a substrate layer such that adjacent substrate layers are bonded together. By controlling the height of each pair of substrate and glass layers, a precisely spaced and strongly bonded stack of substrate layers is formed.

REFERENCES:
patent: 3400210 (1968-09-01), Reimer
patent: 3436604 (1969-04-01), Hyltin et al.
patent: 4304624 (1981-12-01), Carson et al.
patent: 4320438 (1982-03-01), Ibrahim et al.
patent: 4352715 (1982-10-01), Carson et al.
patent: 4354107 (1982-10-01), Carson et al.
patent: 4371744 (1983-02-01), Badet et al.
patent: 4399089 (1983-08-01), Mohri et al.
patent: 4403238 (1983-09-01), Clark
patent: 4423468 (1983-12-01), Gatto et al.
patent: 4525921 (1985-07-01), Carson et al.
patent: 4551629 (1985-11-01), Carson et al.
patent: 4670770 (1987-06-01), Tai
patent: 4740414 (1988-04-01), Shaheen
patent: 4794092 (1988-12-01), Solomon
patent: 4799984 (1989-01-01), Rellick
patent: 4806188 (1989-02-01), Rellick
patent: 4929295 (1990-05-01), Kohno et al.
patent: 4978052 (1990-12-01), Fister et al.

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