Method of forming a polishing pad having reduced striations

Plastic and nonmetallic article shaping or treating: processes – With severing – removing material from preform mechanically,... – Surface finishing

Reexamination Certificate

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Details

C264S161000, C264S109000, C264S118000, C264S051000, C451S526000, C451S041000, C451S059000

Reexamination Certificate

active

10956847

ABSTRACT:
The present invention provides a method of forming a chemical mechanical polishing pad, comprising providing a tank with polymeric materials and providing a storage hopper with microspheres having an initial bulk density, wherein the storage hopper further comprises a porous membrane provided over a plenum. The method further provides the steps of connecting a fluidizing gas source to the plenum through a gas inlet line and fluidizing the microspheres and reducing the initial bulk density by feeding gas into the plenum. In addition, the method further provides the steps of providing a delivery system for delivering the polymeric materials and the microspheres to a mixer, forming a mixture of the polymeric materials and the microspheres, pouring the mixture into a mold to form a molded product and cutting the molded product into the polishing pad.

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