Method of forming a patterned glass layer over the surface of a

Details Method of forming a patterned glass layer over the surface of a Method of forming a patterned glass layer over the surface of a

1987-02-11

1988-03-22

Kittle, John E.

Radiation imagery chemistry: process, composition, or product th

Visible imaging including step of firing or sintering

430311, 430325, 430326, 430330, G03C 1100

Patent

active

047328380

ABSTRACT:
Patterned glass layers which are defect-free and have smooth surfaces are formed by a method wherein a mixture of glass frit and a photoresist composition is applied to the surface of the substrate; the layer is photolithographically patterned by exposing and developing predetermined areas of the layer; then after development and prior to firing of the glass frit, the layer of material is subjected to treatment with a suitable plasma at a temperature below the thermal decomposition temperature of the photoresist composition to remove the photoresist composition from the portion of the resist layer remaining on the substrate; and then the remainder of the layer, consisting essentially of glass frit, is fired to form a smooth, defect-free, patterned glass layer over the surface of the substrate.

REFERENCES:
patent: 3935330 (1976-01-01), Smith et al.
patent: 3982941 (1976-09-01), Inskip
patent: 4201579 (1980-05-01), Robinson et al.
patent: 4241165 (1980-12-01), Hughes et al.
patent: 4278753 (1981-07-01), Lewis et al.
patent: 4332879 (1982-06-01), Pastor et al.
patent: 4619836 (1986-10-01), Prabhu et al.
patent: 4623556 (1986-11-01), Brown et al.

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