Method of forming a pattern using a polarized reticle in...

Radiation imagery chemistry: process – composition – or product th – Radiation modifying product or process of making – Radiation mask

Reexamination Certificate

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C430S394000

Reexamination Certificate

active

07569311

ABSTRACT:
Polarized reticles, photolithography systems utilizing a polarized reticle, and methods of using such a system are disclosed. A polarized reticle is formed having a reticle containing at least one first patterned region at least partially surrounded by at least one second patterned region. The first patterned region of the polarized reticle includes a polarized material and the second patterned region of the polarized reticle also includes a polarized material. Polarization directions of the polarized materials of the two patterned regions are generally orthogonal to each other. When the polarized reticle is irradiated using linear polarized light having a selected polarization direction, the polarized materials on the two patterned regions of the polarized reticle may be selectively used as a filter to enable exposing the different regions of the polarized reticle separately under optimal illumination conditions.

REFERENCES:
patent: 5245470 (1993-09-01), Keum
patent: 5459000 (1995-10-01), Unno
patent: 5673103 (1997-09-01), Inoue et al.
patent: 5677755 (1997-10-01), Oshida et al.
patent: 6057970 (2000-05-01), Kim et al.
patent: 6163367 (2000-12-01), Obszarny
patent: 6605395 (2003-08-01), Grobman et al.
patent: 6645678 (2003-11-01), Wang et al.
patent: 5188576 (1993-07-01), None
patent: 05241324 (1993-09-01), None
patent: 7176476 (1995-07-01), None
patent: 00246363 (1999-06-01), None
patent: 0424263 (2001-03-01), None
patent: 0425495 (2001-03-01), None
patent: WO 02/44817 (2002-06-01), None
Börnig et al, “The Impact of Polarized Illumination on Imaging Characteristics in Optical Microlithography,” Microelectronic Engineering, Elsevier Science B.V., vol. 27, 1995, pp. 217-220.
International Search Report dated Aug. 8, 2005 (4 pages).
Lam et al, “Polarization masks: concept and initial assessment,” Proceedings of SPIE, vol. 4691, 2002, pp. 437-445.
Wang et al., “Polarized Phase Shift Mask: Concept, Design, and Potential Advantages to Photolithography Process and Physical Design,” Proceedings of SPIE, vol. 4562, 2002, pp. 406-417.

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