Method of forming a nitride or carbonitride layer

Metal treatment – Process of modifying or maintaining internal physical... – Carburizing or nitriding using externally supplied carbon or...

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427245, 4272552, 4272554, C23C 1644, B05D 122

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active

054436621

ABSTRACT:
A nitride or carbonitride layer is formed on the surface of a metal material as follows: A treating agent composed of a refractory powder of alumina or the like and a powder of a metal for forming a nitride or a carbide or an alloy thereof is disposed in a fluidized bed furnace; the treating agent is fluidized to form a fluidized bed by introducing an inert gas; the fluidized bed furnace is heated to a temperature of not higher than 700.degree. C.; an activator of a halogenated ammonium salt is intermittently supplied into the fluidized bed at a rate of 0.001 to 5 wt %/hour based on the total amount of the treating agent; and the metal material to be treated is disposed in the fluidized bed during or after any of the above steps. For example, a nitride layer composed of only a metal for forming a nitride which contains almost no Fe--N is formed on the surface of iron steel even at a temperature as low as not higher than 700.degree. C. The layer is very hard and efficient in wear resistance, and the toughness of the base metal is hardly lowered.

REFERENCES:
patent: 4569862 (1986-02-01), Arai et al.
patent: 4623400 (1986-11-01), Japka
patent: 4686117 (1987-08-01), Arai et al.
patent: 4765847 (1988-08-01), Arai
patent: 4844949 (1989-07-01), Arai et al.
patent: 4871401 (1989-10-01), Arai
patent: 4892759 (1990-01-01), Arai et al.
Archer, Wear, 48, 237-250, 1978; "Chemical Vapor Deposited Tungsten Carbide Wear-Resistant Coatings Formed at Low Temperatures".

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