Method of forming a multilayer thin film

Chemistry: electrical and wave energy – Processes and products – Vacuum arc discharge coating

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156643, 156656, 156657, 1566591, 204192E, 427 89, 427 90, 427 91, 427128, 427131, C23C 1500

Patent

active

044628811

ABSTRACT:
A method of forming a multilayer thin film is disclosed in which a second thin conductive film is deposited on a first thin conductive film uninterruptedly after the first thin film has been deposited on a substrate, the first and second films thus formed are processed so as to form a predetermined pattern, the surface of the second thin film is cleaned by ion etching and a third thin conductive film is deposited on the whole surface of the substrate, and then the second and third thin films are processed so as to have a pattern different from the above-mentioned predetermined pattern. In the case where two thin conductive films different in material and pattern from each other are piled on a substrate, the above method can form a perfect interconnection between the two films and can make very small the contact resistance between the two films. Accordingly, the method is fit to form, for example, a barber pole type magnetoresistive element.

REFERENCES:
patent: 3791952 (1974-02-01), Labuda et al.
patent: 4172758 (1979-10-01), Bailey et al.
patent: 4184933 (1980-01-01), Morcom et al.
G. Almasi et al., Fabrication of Magnetic Bubble Domain Memories, IBM Technical Disclosure Bulletin, vol. 15, No. 6, Nov. 1972, pp. 1826-1827.

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