Method of forming a microstructure using maskless lithography

Details Method of forming a microstructure using maskless lithography Method of forming a microstructure using maskless lithography

2007-01-23

2007-01-23

Chambers, A. Michael (Department: 3753)

Fluid handling

Processes

Cleaning, repairing, or assembling

C137S828000, C438S694000, C438S700000

Reexamination Certificate

active

10422237

ABSTRACT:
A method is provided for fabricating a microstructure using maskless lithography. A first layer is provided in a spaced relationship to a base layer so as to define a construction cavity therebetween. The first layer has a passageway therethrough that communicates with the construction cavity. The construction cavity is filled with material and a polymerizing agent is directed towards a portion of the material so as to polymerize the same. The polymerized material defines a channel network and the non-polymerized material is flushed from the channel network.

REFERENCES:
patent: 6167910 (2001-01-01), Chow
patent: 6200646 (2001-03-01), Neckers et al.
patent: 6208087 (2001-03-01), Hughes et al.
patent: 6271957 (2001-08-01), Quate et al.
patent: 6488872 (2002-12-01), Beebe et al.
patent: 6821898 (2004-11-01), Beebe et al.
patent: 2002/0122881 (2002-09-01), Kaeriyama et al.
patent: 2004/0084811 (2004-05-01), Beebe et al.

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