Method of forming a microscopic pattern

Coating processes – Nonuniform coating – Mask or stencil utilized

Patent

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

427 98, 430194, 430197, 430270, 430313, 430314, 430315, 430319, 430324, 430326, B05D 132, C23F 1300

Patent

active

045364214

ABSTRACT:
A negative photoresist having benzene rings is irradiated with short-wavelength ultraviolet radiation, and is developed to form a photoresist pattern whose sectional shape is an inverted trapezoid. Using the photoresist pattern, the lift-off process having heretofore required troublesome steps can be performed very easily.

REFERENCES:
patent: 4115120 (1978-09-01), Dyer et al.
patent: 4148655 (1979-04-01), Itoh et al.
patent: 4211834 (1980-07-01), Lapadula et al.
patent: 4212935 (1980-07-01), Canavello et al.
Iwayanagi et al., J. Electrochem. Soc., vol. 127, No. 12, 12/1980, pp. 2759-2760.
Tsunoda et al., Photo Sci. & Eng., vol. 17, No. 4, 7/1973, pp. 390-393.
Maissel et al., Handbook of Thin Film Technology, McGraw Hill Book Co., New York, .COPYRGT.1970, pp. 7, (32-34).

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Method of forming a microscopic pattern does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Method of forming a microscopic pattern, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Method of forming a microscopic pattern will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-560728

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.