Method of forming a microscopic pattern

Details Method of forming a microscopic pattern Method of forming a microscopic pattern

1981-07-30

1985-08-20

Bueker, Richard

Coating processes

Nonuniform coating

Mask or stencil utilized

427 98, 430194, 430197, 430270, 430313, 430314, 430315, 430319, 430324, 430326, B05D 132, C23F 1300

Patent

active

045364214

ABSTRACT:
A negative photoresist having benzene rings is irradiated with short-wavelength ultraviolet radiation, and is developed to form a photoresist pattern whose sectional shape is an inverted trapezoid. Using the photoresist pattern, the lift-off process having heretofore required troublesome steps can be performed very easily.

REFERENCES:
patent: 4115120 (1978-09-01), Dyer et al.
patent: 4148655 (1979-04-01), Itoh et al.
patent: 4211834 (1980-07-01), Lapadula et al.
patent: 4212935 (1980-07-01), Canavello et al.
Iwayanagi et al., J. Electrochem. Soc., vol. 127, No. 12, 12/1980, pp. 2759-2760.
Tsunoda et al., Photo Sci. & Eng., vol. 17, No. 4, 7/1973, pp. 390-393.
Maissel et al., Handbook of Thin Film Technology, McGraw Hill Book Co., New York, .COPYRGT.1970, pp. 7, (32-34).

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