Method of forming a micro structure and an x-ray mask

Details Method of forming a micro structure and an x-ray mask Method of forming a micro structure and an x-ray mask

1994-03-23

1996-06-18

Rosasco, S.

Radiation imagery chemistry: process, composition, or product th

Radiation modifying product or process of making

Radiation mask

430 8, 430 24, 430326, 430967, G03F 900

Patent

active

055276466

ABSTRACT:
A method of forming a microstructure having a higher aspect ratio by using a general purpose synchrotron orbital radiation apparatus is provided. A resist layer mainly including a copolymer of methylmethacrylate and methacrylic acid is formed relatively thick on a substrate. Lithography by synchrotron orbital radiation is carried out on the resist layer, to form a resist pattern. By carrying out normal electroplating, electro-forming or the like in accordance with the resist pattern, a microstructure having a high aspect ratio is obtained.

REFERENCES:
patent: 4125672 (1978-11-01), Kakuchi et al.
patent: 5298367 (1994-03-01), Hoessel et al.
Nikkei Mechanical 1990. Nov. 26, pp. 72-79.
Kikai Sekkei vol. 3, No. 6 (May, 1991) pp. 26-28.
J. Electrochem., Soc., vol. 1126, No. 1 (1979) pp. 154-161.

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