Single-crystal – oriented-crystal – and epitaxy growth processes; – Processes of growth from solid or gel state
Patent
1996-05-03
1998-01-27
Kunemund, Robert
Single-crystal, oriented-crystal, and epitaxy growth processes;
Processes of growth from solid or gel state
117 9, 117944, C30B 110
Patent
active
057118043
ABSTRACT:
Oxide coatings are formed with a desired crystallographic texture over a large surface area. A metallic substrate is electrodeposited or vacuum deposited with a preferred crystallographic orientation, and a sol-gel/thermal process is used to form a "pseudo-epitaxial" oxide coating having crystallites that are influenced by the crystallographic orientation of the substrate. In one embodiment, p-type nickel oxide coatings with desirable electronic properties are produced by sol-gel/thermal processing on nickel substrates electrodeposited from a sulfamate nickel bath at a relatively high current density and low temperature. The electrodeposited nickel substrate has a strong Ni{100} preferred orientation. Epitaxial effects during sol-gel/thermal formation of NiO on the electrodeposited substrate enhance the extent to which the NiO{100} and NiO{111} crystal facets are aligned parallel to the coating surface, and minimize the NiO{110} orientation. This texture modification significantly improves the photoresponse of the nickel oxide coating. The method is anticipated to be useful in other metal oxide/metal substrate systems for the production of catalysts, cathodes for lithium ion and nickel-cadmium batteries, photoelectrochemical printed circuits, high-temperature electronic devices, flat panel displays, photoelectrochemical solar cells, and sensors. An advantage of the invention is that electrodeposition, vacuum deposition, and sol-gel/thermal processes are suitable for coating large surface areas.
REFERENCES:
patent: 5206102 (1993-04-01), Tench
S.K. Verma and H. Wilman, "The Structure and Crystal Growth of Nickel Electrodeposits from a Sulfamate Bath on Polished Polycrystalline Copper, in Relation to Thickness, Rate of Deposition, Temperature and Stirring", J. Phys. D: Appl. Phys., vol. 4, pp. 2051-2065 (1971).
A.K.N. Reddy and S.R. Rajagopalan, "Preferred Orientations in Nickel Electro-Deposits I-III," J. Electroanal. Chem., vol. 6, pp. 141-163 (1963).
Beach et al. "Thickness dependent electric properties of sol-gel preparing level lanthan titanate films", Integr. Ferroelectr (1995), vol. 7(1-4), pp. 161-171 abs only.
Chung Young J.
Tench D. Morgan
Warren, Jr. Leslie F.
Kunemund Robert
Rockwell International Corporation
LandOfFree
Method of forming a metallic oxide coating with a desired crysta does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Method of forming a metallic oxide coating with a desired crysta, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Method of forming a metallic oxide coating with a desired crysta will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-338655