Method of forming a groove in a semiconductor laser diode and a

Coherent light generators – Particular active media – Semiconductor

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372 45, H01S 318

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active

055661980

ABSTRACT:
The disclosure describes a method of forming a groove in a structure of a semiconductor laser diode, which comprises a crystal growth procedure of epitaxial growth of a core layer comprising MP, wherein M represents one or more of elements belonging to group IIIb of periodic table and an upper layer comprising MAs, wherein M represents one or more of elements belonging to group IIIb of periodic table, successively on (100) surface of MAs crystals in a lower layer comprising MAs; a photolithography and wet etching procedure of, after forming an etching mask on the upper layer, forming an etching window to the etching mask; a first etching procedure of selective etching the upper layer; and a second etching procedure of selective etching other faces except for the face in which (111) face of MP crystals in the core layer is exposed.

REFERENCES:
patent: 4613387 (1986-09-01), Turley
patent: 5163064 (1992-11-01), Kim et al.
patent: 5390205 (1995-02-01), Mori et al.
Patent Abstracts of Japan, vol. 16, No. 308 (1992). JP4085503.
Patent Abstracts of Japan, vol. 8, No. 13 (1984). JP 8175886.

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