Method of forming a filter for a solid-state image sensing devic

Details Method of forming a filter for a solid-state image sensing devic Method of forming a filter for a solid-state image sensing devic

1998-05-26

1999-10-19

Chaudhuri, Olik

Semiconductor device manufacturing: process

Making device or circuit responsive to nonelectrical signal

Responsive to electromagnetic radiation

438 75, 257432, 257440, H01L 27148

Patent

active

059703172

ABSTRACT:
In a method of forming a color filter for use in a solid-state image sensing device forming a color filter made of a resist material on a planarized layer made of a thermosetting resin formed on the surface of a solid-state image sensing device, a temperature for the heat treatment upon forming the color filter is defined as equal to or higher than 205.degree. C. and less than 220.degree. C., so that occurrence of micro-cracks in the planarized layer made of the thermosetting resin can be prevented.

REFERENCES:
patent: 5028547 (1991-07-01), Iizuka et al.
patent: 5479049 (1995-12-01), Aoki et al.
patent: 5493143 (1996-02-01), Hokari
patent: 5514888 (1996-05-01), Sano et al.
patent: 5654202 (1997-08-01), Daly et al.
patent: 5695911 (1997-12-01), Itoh et al.
patent: 5739548 (1998-04-01), Shigeta et al.
patent: 5766980 (1998-06-01), Ohtagaki
patent: 5800952 (1998-09-01), Urano et al.
patent: 5877040 (1999-03-01), Park et al.

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