Method of forming a film pattern on a substrate

Details Method of forming a film pattern on a substrate Method of forming a film pattern on a substrate

1990-03-27

1993-07-20

Owens, Terry J.

Coating processes

Nonuniform coating

Applying superposed diverse coatings or coating a coated base

427108, 427109, 427110, 4271262, 4271263, 427264, B05D 132

Patent

active

052291677

ABSTRACT:
A film pattern of a desired material is formed on a substrate by forming a pattern of powder of inorganic material on the substrate, forming at least a single layer of film of desired material on the substrate on which the pattern of the powder of inorganic material is formed so that a part of the film of the desired material is formed on at least a part of the pattern of the powder of inorganic material, and mechanically removing the pattern film of the powder of inorganic material together with a part of the film of the desired material formed thereon.

REFERENCES:
patent: 3056696 (1962-10-01), Browne
patent: 3632339 (1972-01-01), Khan
patent: 3978249 (1976-08-01), Cooke
patent: 3991227 (1976-11-01), Carlson et al.
patent: 4424271 (1984-01-01), Keel et al.
patent: 4477486 (1984-10-01), Boaz
patent: 4572880 (1986-02-01), Miura

Affiliated with

Also associated with

Rating

Method of forming a film pattern on a substrate does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Method of forming a film pattern on a substrate, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Method of forming a film pattern on a substrate will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-1759037