Method of forming a diamond film

Details Method of forming a diamond film Method of forming a diamond film

1988-02-25

1990-04-10

Silverman, Stanley

Coating processes

Electrical product produced

Integrated circuit, printed circuit, or circuit board

423446, 427 38, 427 39, B05D 306

Patent

active

049159771

ABSTRACT:
A method of forming a diamond film on a substrate wherein hydrogen, a hydrocarbon series gas, an inert gas, an organic compound series gas or a mixture of such gases is introduced into a vacuum vessel to contact a substrate and carbon is evaporated by are discharge at a carbon cathode while applying a voltage to the substrate to deposit carbon on the substrate thus forming a diamond film on the substrate. A silicon series gas, a germanium series gas or a mixture thereof may be also introduced into the vessel with the foregoing gas or gases. While the carbon is being deposited on the substrate, thermoelectrons may also be supplied onto the substrate, and, further, high frequency discharge may be generated in a space between the substrate and the cathodes.

REFERENCES:
patent: 3961103 (1976-06-01), Aisenberg
patent: 4228142 (1980-10-01), Holcombe, Jr. et al.
patent: 4490229 (1984-12-01), Mirtich et al.
patent: 4725345 (1988-02-01), Sakamoto et al.
patent: 4767608 (1988-08-01), Matsumoto et al.

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