Method of forming a decorative metallic nitride coating

Coating processes – Electrical product produced – Integrated circuit – printed circuit – or circuit board

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204192N, 204177, C23C 1304

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active

044204981

ABSTRACT:
There is disclosed a method for forming a decorative metallic nitride coating on the surface of a substrate comprising the steps of disposing said substrate to be coated as a cathode in a material gas atmosphere at a pressure of 0.1 to 10 Torr, with said substrate maintained at a temperature of 200.degree. to 1000.degree. C., and applying a voltage of 200 to 8000 V to said substrate to prepare a direct current glow discharge space in the vicinity of said substrate, the improvement which comprises using as said material gas a mixed gas of a halide of titanium, zirconium or hafnium; hydrogen; and nitrogen, and controlling the current density of the electric current flowing through said substrate to be within the range of 0.01 to 1 mA/cm.sup.2.
The method according to the present invention provides a uniform and beautiful metallic nitride coating which has a metallic luster stable with time, is excellent in mar resistance, and is suitable for decoration. Further, according to the method of this invention, a decorative metallic nitride coating capable of varying a tone on a metallic luster surface over a wide range can be formed.

REFERENCES:
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patent: 4346123 (1982-08-01), Kaufmann
Patents Abstracts of Japan, vol. 4, No. 26, p. 115 C1, Mar. 6, 1980.
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Suri, AK, "Synthesis of Titanium Nitrides by Activated Reactive Evaporation," Thin Solid Films, 72 (1980), pp. 529-533.
Proceedings of Conference on Ion Plating and Applied Techniques, IPAT 77 (1977), p. 243.

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