Method of forming a contact structure

Details Method of forming a contact structure Method of forming a contact structure

2006-10-10

2008-05-13

Le, Thao P. (Department: 2818)

Semiconductor device manufacturing: process

Making device or circuit responsive to nonelectrical signal

Responsive to electromagnetic radiation

C438S098000

Reexamination Certificate

active

07371604

ABSTRACT:
Contact structures having I shapes and L shapes, and methods of fabricating I-shaped and L-shaped contact structures, are employed in semiconductor devices and, in certain instances, phase-change nonvolatile memory devices. The I-shaped and L-shaped contact structures produced by these methods exhibit relatively small active areas. The methods that determine the contact structure dimensions employ conventional semiconductor deposit and etch processing steps that are capable of creating readily reproducible results.

REFERENCES:
patent: 6437393 (2002-08-01), Pio
patent: 6847535 (2005-01-01), Gilton et al.

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