Method of forming a carbon film on a substrate made of an oxide

Details Method of forming a carbon film on a substrate made of an oxide Method of forming a carbon film on a substrate made of an oxide

1991-09-26

1993-07-13

Beck, Shrive

Coating processes

Coating by vapor, gas, or smoke

Carbon or carbide coating

427255, 4272551, 4272557, 428698, 428699, C23C 1626, C23C 1634

Patent

active

052271960

ABSTRACT:
A lamination of films is comprised of at least two film layers wherein a first film with the smallest internal stress is provided for the first layer directly on the substrate, and a second film is provided with the second smallest amount of internal stress for the second layer on the first layer, and when more than two layers are provided, additional layers of films are provided with increasing magnitude of internal stress, in sequence, in the direction of lamination from the side of the substrate. In accordance with one aspect, the hydrogen concentration of a silicon nitride layer is controlled to obtain optimum properties of the silicon nitride layer as a buffer layer between a carbon layer and an oxide substrate.

REFERENCES:
patent: 4132818 (1979-01-01), Chappelow et al.
patent: 4699801 (1987-10-01), Ito et al.
patent: 4707384 (1987-11-01), Schachner et al.
patent: 4737379 (1988-04-01), Hudgens et al.
patent: 4755426 (1988-07-01), Kokai et al.
patent: 4988421 (1991-01-01), Drawl et al.

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