Method of fine feature edge tuning with optically-halftoned mask

Details Method of fine feature edge tuning with optically-halftoned mask Method of fine feature edge tuning with optically-halftoned mask

1998-04-06

2000-09-05

Rosasco, S.

Radiation imagery chemistry: process, composition, or product th

Radiation modifying product or process of making

Radiation mask

G03F 900

Patent

active

061140716

ABSTRACT:
A photolithography mask for optically transferring a lithographic pattern corresponding to an integrated circuit from the mask onto a semiconductor substrate by use of an optical exposure tool. The mask comprises a plurality of features corresponding to elements forming the integrated circuit, and a plurality of non-resolvable biasing segments disposed on an edge of at least one of the features.

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