Etching a substrate: processes – Forming or treating material useful in a capacitor
Reexamination Certificate
2006-04-04
2006-04-04
Alanko, Anita (Department: 1765)
Etching a substrate: processes
Forming or treating material useful in a capacitor
C216S013000, C216S049000, C216S088000, C438S384000, C438S393000, C438S689000, C438S692000, C438S970000, C029S610100, C029S846000
Reexamination Certificate
active
07022246
ABSTRACT:
A method is disclosed of fabricating a MIMCAP (a capacitor (CAP) formed by successive layers of metal, insulator, metal (MIM)) and a thin film resistor at the same level. A method is also disclosed of fabricating a MIMCAP and a thin film resistor at the same level, and a novel integration scheme for BEOL (back-end-of-line processing) thin film resistors which positions them closer to FEOL (front-end-of-line processing) devices.
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Chinthakindi Anil K.
Jeng Shwu-Jen
Lofaro Michael F.
Schnabel Christopher M.
Stein Kenneth J.
Alanko Anita
Anderson, Esq. Jay H.
International Business Machines - Corporation
Scully , Scott, Murphy & Presser, P.C.
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