Method of fabrication glass diaphragm on silicon macrostructure

Details Method of fabrication glass diaphragm on silicon macrostructure Method of fabrication glass diaphragm on silicon macrostructure

1995-05-02

1996-11-26

Kunemund, Robert

Fishing, trapping, and vermin destroying

437238, 437240, 437901, 437927, 437921, 73777, 73754, 148DIG73, 1566621, 3612832, 3612834, 310324, G01L 900, G01L 908, H01L 21465, H01L 21316

Patent

active

055785280

ABSTRACT:
A method for fabricating microelectromechanical systems containing a glass diaphragm formed on a silicon macrostructure is disclosed. The method comprises the steps of: (a) obtaining a silicon wafer and forming a cavity in the silicon wafer; (b) using a flame hydrolysis deposition technique to deposite glass soot into the cavity, the glass soot fills the cavity and extends onto the external surface of the silicon wafer so as to form a glass soot layer having a predetermined thickness; and (c) heat-consolidating the glass soot at temperatures between 850.degree. and 1,350.degree. C. so as to cause the glass soot to shrink and form a glass diaphragm over the cavity. The shrinkage ratio between the glass diaphragm and the glass soot layer is between 1:20 to 1:50. The silicon wafer can be further fabricated to contain a diaphragm-sealed cavity and/or a diaphragm-converted cantilever.

REFERENCES:
patent: 4664762 (1987-05-01), Hirata
patent: 4872945 (1989-10-01), Myers et al.
patent: 5177661 (1993-01-01), Zarracky et al.
patent: 5189591 (1993-02-01), Bernot
patent: 5242863 (1993-09-01), Xiang-Zheng et al.
patent: 5245504 (1993-09-01), Bullis et al.
patent: 5279162 (1994-01-01), Takebe et al.
patent: 5307684 (1994-05-01), Moss et al.
patent: 5310441 (1994-05-01), Tsutsumi et al.
patent: 5335550 (1994-08-01), Satou
patent: 5343756 (1994-09-01), Nakamura et al.
Michael A. Huff et al. "Design of Sealed Cavity Microstructures Formed by Silicon Wafer Bonding" Journal of Microelectromechanical Systems, vol. 2, No. 1, Jun. 1993, pp. 74-81.

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