Method of fabricating X-ray masks with reduced errors

Details Method of fabricating X-ray masks with reduced errors Method of fabricating X-ray masks with reduced errors

1996-05-28

1999-12-28

Rosasco, S.

Radiation imagery chemistry: process, composition, or product th

Radiation modifying product or process of making

Radiation mask

378 35, G03F 900

Patent

active

060079487

ABSTRACT:
A method of fabricating an X-ray mask including forming a membrane layer on a wafer and forming a layer of X-ray absorbing material on the membrane layer. A pattern is defined on the absorbing layer with positions that are predistorted in accordance with the following equations, and their extensions if desired:

REFERENCES:
patent: 4621371 (1986-11-01), Gotou et al.

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