Method of fabricating waveguide using sacrificial spacer layer

Details Method of fabricating waveguide using sacrificial spacer layer Method of fabricating waveguide using sacrificial spacer layer

2006-06-07

2009-10-06

Healy, Brian M. (Department: 2883)

Optical waveguides

Planar optical waveguide

C385S130000, C385S131000, C438S029000, C438S030000, C438S031000, C065S385000, C065S386000

Reexamination Certificate

active

07599594

ABSTRACT:
The present invention is a method of fabricating a waveguide using a sacrificial spacer layer. The first step in this process is to fabricate the underlying optical semiconductor structure. A trench is then etched in this structure and a sacrificial spacer layer is deposited in the trench. The waveguide is then created in the trench on the sacrificial spacer layer. User-defined portions of the sacrificial spacer layer are subsequently removed to create air gaps between the waveguide and the sidewalls of the trench in the optical semiconductor.

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