Fishing – trapping – and vermin destroying
Patent
1995-11-01
1999-12-14
Niebling, John
Fishing, trapping, and vermin destroying
437237, 437239, 437935, 437983, 437186, 437 41, H01L 21465
Patent
active
060009470
ABSTRACT:
A scanning probe microscope is used to fabricate a gate or other feature of a transistor by scanning a silicon substrate in which the transistor is to be formed. An electric field is created between the cantilever tip and the silicon substrate, thereby causing an oxide layer to be formed on the surface of the substrate. As the tip is scanned across the substrate the electric field is switched on and off so that an oxide pattern is formed on the silicon. Preferably, the oxide pattern is formed on a deposited layer of amorphous silicon. Extremely small features, e.g., a MOSFET gate having a length of 0.2 .mu.m or less can be fabricated by this technique.
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"Silicon tran
Minne Stephen Charles
Quate Calvin F.
Soh Hyongsok
Bilodeau Thomas G.
Niebling John
Steuber David E.
The Board of Trustees of the Leland Stanford, Jr.
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