Method of fabricating thin layers from high-temperature oxide su

Details Method of fabricating thin layers from high-temperature oxide su Method of fabricating thin layers from high-temperature oxide su

1989-02-13

1990-10-23

Kaplan, G. L.

Superconductor technology: apparatus, material, process

High temperature , per se

Having tc greater than or equal to 150 k

20419224, 20429807, 20429813, 505731, C23C 1408

Patent

active

049652486

ABSTRACT:
A method and apparatus for producing thin superconductor film of high temperature oxide type ceramic superconductors by cathodic sputtering and in which the highest possible oxygen partial pressure is utilized in the space between the cathode and the substrate. Ionizing radiation can be introduced into the space as well.

REFERENCES:
patent: 4842704 (1989-06-01), Collins et al.
G. K. Wehner et al., Appl. Phys. Lett., 52(14), pp. 1187-1189, Apr. 4, 19 8.
U. Poppe et al., Solid State Communications, vol. 66, No. 6, pp. 661-665, (1988).

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