Method of fabricating thin film transistor array substrate

Details Method of fabricating thin film transistor array substrate Method of fabricating thin film transistor array substrate

2007-04-03

2007-04-03

Nhu, David (Department: 2818)

Semiconductor device manufacturing: process

Making device or circuit emissive of nonelectrical signal

Including integrally formed optical element

C438S197000, C438S381000, C257S395000, C257S399000, C257S703000

Reexamination Certificate

active

10969179

ABSTRACT:
A method of fabricating a thin film transistor array substrate is provided. The method includes forming a first conductive pattern group on a substrate using a first etch resist and a first soft mold, the first conductive pattern group including a gate electrode and a gate line; forming a gate insulating film on the substrate and the first conductive pattern group; forming a second conductive pattern group and a semiconductor pattern on the gate insulating film using a second etch resist and a second soft mold, the second conductive pattern group having a source electrode, a drain electrode, and a data line, the semiconductor pattern defining a channel region between the source electrode and the drain electrode; forming a passivation film on the gate insulating film, the second conductive pattern group and the semiconductor pattern using a third etch resist and a third soft mold, the passivation film defining a contact hole therethrough; and forming a third conductive pattern group on the passivation film using a fourth etch resist and a fourth soft mold, the third conductive pattern group having a pixel electrode.

REFERENCES:
patent: 6818923 (2004-11-01), Kim et al.
patent: 7001541 (2006-02-01), Dhar
patent: 2003/0197182 (2003-10-01), Kim et al.
patent: 2003/0197187 (2003-10-01), Kim et al.
patent: 2006/0121815 (2006-06-01), Kim et al.

Affiliated with

Also associated with

Rating

Method of fabricating thin film transistor array substrate does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Method of fabricating thin film transistor array substrate, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Method of fabricating thin film transistor array substrate will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-3787737