Stock material or miscellaneous articles – Magnetic recording component or stock – Magnetic recording media substrate
Reexamination Certificate
2008-09-16
2010-12-14
Bernatz, Kevin M. (Department: 1785)
Stock material or miscellaneous articles
Magnetic recording component or stock
Magnetic recording media substrate
C428S848800, C360S135000, C257S377000, C438S487000
Reexamination Certificate
active
07851076
ABSTRACT:
In this invention, etching is not performed in the step of planarizing a polycrystalline Si wafer, but only mechanical grinding is performed for planarization. This is because, since the etching rate is crystal-face dependent, etching of the polycrystalline Si wafer unavoidably results in formation of steps due to different crystal face orientations of individual crystal grains exposed on a surface of the wafer, thus hindering precision surface planarization. Subsequently, the Si wafer surface is coated with an oxide film to form an Si wafer with oxide film prior to the final polishing stage and then a surface of the oxide film is planarized, to give a planar substrate (i.e., Si substrate with oxide film) having no step on the surface thereof.
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Bernatz Kevin M.
Falasco Louis
Oblon, Spivak McClelland, Maier & Neustadt, L.L.P.
Shin-Etsu Chemical Co. , Ltd.
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