Method of fabricating self-aligned FET structure having a high t

Fishing – trapping – and vermin destroying

Patent

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

437 41, 437192, 437912, 437944, 148DIG3, 148DIG100, 148DIG131, 148DIG140, 257283, 257486, H01L 21265

Patent

active

055500650

ABSTRACT:
A method of fabricating a self-aligned FET having a semi-insulating substrate of GaAs or InP with a conductive channel formed either by doping the surface or an epitaxially grown channel by molecular beam epitaxy or metalorganic vapor phase epitaxy in the substrate adjacent the surface. Forming a high temperature stable LaB.sub.6 /TiWN "T-shaped" Schottky gate contact on the substrate surface, which is used for source and drain ohmic region implants into the substrate adjacent to the surface and self-aligned to the "T-shaped" gate, with source and drain ohmic contacts also self-aligned with respect to the gate.

REFERENCES:
patent: 4679311 (1987-07-01), Lakhani et al.
patent: 4712219 (1987-12-01), Yano et al.
patent: 4735913 (1988-04-01), Hayes
patent: 4782032 (1988-11-01), Geissberger et al.
patent: 4845534 (1989-07-01), Fukuta
patent: 4849376 (1989-07-01), Balzan et al.
patent: 4977100 (1990-12-01), Shimura
patent: 5225360 (1993-07-01), Shim et al.
patent: 5245207 (1993-07-01), Mikoshiba et al.
patent: 5332627 (1994-07-01), Watanabe et al.
patent: 5381027 (1995-01-01), Usagawa et al.

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Method of fabricating self-aligned FET structure having a high t does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Method of fabricating self-aligned FET structure having a high t, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Method of fabricating self-aligned FET structure having a high t will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-1055950

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.