Method of fabricating row lines of a field emission array...

Details Method of fabricating row lines of a field emission array... Method of fabricating row lines of a field emission array...

2005-04-12

2005-04-12

Patel, Nimeshkumar D. (Department: 2879)

Electric lamp or space discharge component or device manufacturi

Process

With assembly or disassembly

C445S025000, C313S309000, C313S310000, C313S311000

Reexamination Certificate

active

06878029

ABSTRACT:
A method for fabricating row lines and pixel openings of a field emission array that employs only two masks. A first mask is disposed over electrically conductive material and semiconductive material and includes apertures that are alignable between rows of pixels of the field emission array. Row lines of the field emission array are defined through the first mask. A passivation layer is then disposed over at least selected portions of the field emission array. A second mask, including apertures alignable over the pixel regions of the field emission array, is disposed over the passivation layer. The second mask is used in defining openings through the passivation layer and over the pixel regions of the field emission array. Conductive material exposed through the apertures of the second mask may also be removed to expose the underlying semiconductive grid and to further define the pixel openings.

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