Method of fabricating polishing pad having detection window...

Details Method of fabricating polishing pad having detection window... Method of fabricating polishing pad having detection window...

2011-01-25

2011-01-25

Watkins, III, William P (Department: 1783)

Stock material or miscellaneous articles

Structurally defined web or sheet

Continuous and nonuniform or irregular surface on layer or...

C428S409000, C451S298000, C451S526000, C451S527000, C451S533000, C451S548000, C051S298000, C051S299000, C051S300000, C156S293000, C156S303100, C264S046400, C264S271100

Reexamination Certificate

active

07875335

ABSTRACT:
The present invention provides a polishing pad. The polishing pad comprises a transparent part and a high molecular weight layer. The transparent part has an uneven side surface and the profile of the uneven side surface is selected from a group consisting of a serrated shape, a wavy shape and a toothed shape. The high molecular weight layer encircles the transparent part.

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Rohm and Haas, “IC1000 Polishing Pad”, accessed on Dec. 18, 2009 from www.salemdist.com/precision/pdf/tech/pads/c—Special—Application/TECH—IC.pdf.
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