Radiation imagery chemistry: process – composition – or product th – Radiation modifying product or process of making – Radiation mask
Patent
1991-04-15
1993-03-16
McCamish, Marion E.
Radiation imagery chemistry: process, composition, or product th
Radiation modifying product or process of making
Radiation mask
430 22, 430269, 430311, 430396, G03F 900
Patent
active
051943468
ABSTRACT:
A method of fabricating phase shifting reticles that can be used as a mask in photolithographic processes such as semiconductor wafer patterning. An opaque film such as chromium is first deposited on a transparent substrate. The opaque film is then patterned with openings by a first photolithographic process. A phase shifter material such as (SiO.sub.2) is then blanket deposited into the openings and over the opaque film. The phase shifter material is then polished by chemical mechanical planarization (CMP) to a thickness "T" which is selected to produce a 180.degree. phase shift. The phase shifter material is then photopatterned and selectively etched by a second photolithographic process to remove all of the phase shifter material except in every other opening formed in the opaque film. This forms a repetitive pattern of alternating phase shifters and light transmission openings through the opaque film.
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Cathey, Jr. David A.
Rolfson J. Brett
Gratton Stephen A.
McCamish Marion E.
Micro)n Technology, Inc.
Rosasco S.
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