Radiation imagery chemistry: process – composition – or product th – Radiation modifying product or process of making – Radiation mask
Patent
1991-03-26
1993-03-16
McCamish, Marion E.
Radiation imagery chemistry: process, composition, or product th
Radiation modifying product or process of making
Radiation mask
430 22, 430269, 430311, 430396, G03F 900
Patent
active
051943441
ABSTRACT:
A method of fabricating phase shifting reticles that can be used as a mask in photolithographic processes such as semiconductor wafer patterning. An opaque film such as chromium is first deposited on a transparent substrate. The opaque film is then patterned with openings by a first photolithographic step. A phase shifter material such as (SiO.sub.2) is then deposited into the openings to form phase shifter sections. The phase shifter sections are then polished by chemical mechanical planarization (CMP) to a thickness "T" which is selected to produce a 180.degree. phase shift. A pattern of light apertures is then formed by a second photolithographic process in the opaque film such that a reticle having a repetitive phase shifting pattern is formed.
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Cathey, Jr. David A.
Rolfson J. Brett
Gratton Stephen A.
McCamish Marion E.
Micro)n Technology, Inc.
Rosasco S.
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