Radiation imagery chemistry: process – composition – or product th – Radiation modifying product or process of making – Radiation mask
Patent
1991-05-14
1993-03-16
McCamish, Marion E.
Radiation imagery chemistry: process, composition, or product th
Radiation modifying product or process of making
Radiation mask
430 22, 430269, 430311, 430396, G03F 900
Patent
active
051943450
ABSTRACT:
A method of fabricating phase shifting reticles that can be used as a mask in photolithographic processes such as semiconductor wafer patterning. An opaque material is deposited onto a quartz substrate to a predetermined thickness. The opaque material is then patterned with openings to form a pattern of opaque light blockers and light transmission openings on the substrate. A phase shifter material is then deposited over the opaque light blockers and into the light transmission openings. This forms a pattern of rim phase shifters on the sidewalls of each light blocker with a light transmission opening between adjacent light blockers. In use, in photopatterning a semiconductor wafer, phase canceling produced by light diffracted through the rim phase shifters and by the opaque light blockers enhances the edge contrast of a pattern produced by the opaque light blockers.
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Gratton Stephen A.
McCamish Marion E.
Micro)n Technology, Inc.
Rosasco S.
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