Coating processes – Magnetic base or coating – Magnetic coating
Reexamination Certificate
2006-07-25
2006-07-25
Chen, Bret (Department: 1762)
Coating processes
Magnetic base or coating
Magnetic coating
C427S240000, C427S430100
Reexamination Certificate
active
07081269
ABSTRACT:
A method of fabricating a patterned polymer film with nanometer scale includes filling particles each having a predetermined size in a pattern provided to a soft polymer mold to prepare an embossed stamp; placing the embossed stamp on a desired polymer film; allowing the embossed stamp placed on the polymer film to stand at temperatures higher than a glass transfer temperature of the polymer film for a predetermined time; and releasing the embossed stamp from the polymer film. Alternatively, the patterned polymer film is obtained by filling particles each having a predetermined size in a pattern provided to a soft polymer mold to prepare an embossed stamp; placing the embossed stamp on a coating layer of a polymer precursor formed on a substrate; curing the coating layer; and releasing the embossed stamp from the cured coating layer.
REFERENCES:
patent: 4420527 (1983-12-01), Conley
patent: 5289311 (1994-02-01), McClelland et al.
patent: 5554432 (1996-09-01), Sandor et al.
patent: 5761801 (1998-06-01), Gebhardt et al.
patent: 6375870 (2002-04-01), Visovsky et al.
patent: 6517995 (2003-02-01), Jacobson et al.
patent: 6656790 (2003-12-01), Jang et al.
patent: 6866801 (2005-03-01), Mau et al.
Aizenberg, J. et al., “Patterned Colloidal Deposition Controlled by Electrostatic and Capillary Forces,”Physical Review Letters, vol. 84, No. 13, pp. 2997-3000, The American Physical Society (2000).
Bechinger, C. et al., “Submicron metal oxide structures by a sol-gel process on patterned substrates,”Thin Solid Films, vol. 366, pp. 135-138, Elsevier Science S.A. (2000).
Chen, W. and H. Ahmed, “Fabrication of 5-7 nm wide etched lines in silison using 100 keV electron-beam lithography and polymethylmethacrylate resist,”Applied Physics Letters, vol. 62, No. 13, pp. 1499-1501, The American Institute of Physics (1993).
Chou, S. Y. et al., “Imprint Lithography with 25-Nanometer Resolution,”Science, vol. 272, pp. 85-87, The American Institution for the Advancement of Science (1996).
Dimitrov, A.S. and K. Nagayama, “Continuous Convective Assembling of Fine Particles into Two-Dimensional Arrays on Solid Surfaces,”Langmuir: The ACS Journal of Surfaces and Colloids, vol. 12, No. 5, pp. 1303-1311, The American Chemical Society (1996).
Frigo, N.J., “Passive Optical Networks,”Optics&Photonics News, pp. 24-29 (1996).
Hagleitner, C. et al., “Smart single-chip gas sensor microsystem,”Nature, vol. 414, Issue No. 6861, pp. 293-296, Nature Publishing Group (2001).
Heegr, A.J. and J. Long Jr., “Conjugating polymers,”Optics&Photonics News, pp. 24-30 (1996).
Hulteen, J.C. et al., “Nanosphere Lithography Size-Tunable Silver Nanoparticle and Surface Cluster Arrays,”Journal of Physical ChemistryB, vol. 103, No. 19, pp. 3854-3863, The American Chemical Society (1999).
Kim, S.-R et al., “Fabrication of Polymeric Substrates with Well-Defined Nanometer-Scale Topography and Tailored Surface Chemistry,”Advanced Materials, vol. 14, No. 20, pp. 1468-1472, Wiley-VCH Verlag GmbH & Co. (Oct. 2002).
Krug, C. and J.F. Hartwig, “Direct Observation of Aldehyde Insertion into Rhodium-Aryl and—Alkoxide Complexes,”Journal of the American Chemical Society, vol. 124, No. 8, pp. 1674-1679, The American Chemical Society (published on web Jan. 2002).
Kumar, A. and G.M. Whitesides, “Features of gold having micrometer to centimeter dimensions can be formed through a combination of stamping with an elastomeric stamp and an alkanethiol “Ink” followed by chemical etching,”Applied Physics Letters, vol. 63, No. 14, pp. 2002-2004, The American Institute of Physics (1993).
Li, H. et al., “High-Resolution Contact Printing with Dendrimers,”Nano Letters, vol. 2, No. 4, pp. 347-349, The American Chemical Society (published on web Feb. 2002).
Li, H.-W. et al., “Nanocontact Printing: A Route to Sub-50-nm-Scale Chemical and Biological Patterning,”Langmuir: The ACS Journal of Surfaces and Colloids, vol. 19, No. 6, pp. 1963-1965, The American Chemical Society (published on web Jan. 2003).
Mikrajuddin, F.I. and K. Okuyama, “Single Route for Producing Organized Metallic Domes, Dots, and Pores by Colloidal Templating and Over-Sputtering,”Advanced Materials, vol. 14, No. 12, pp. 930-933, Wiley-VCH Verlag GmbH (Jun. 2002).
Odom, T.W. et al., “Improved Pattern Transfer in Soft Lithography Using Composite Stamps,”Langmuir: The ACS Journal of Surfaces and Colloids, vol. 18, No. 13, pp. 5314-5320, The American Chemical Society (published on web May 2002).
Schmid, H. and B. Michel, “Siloxane Polymers for High-Resolution, High-Accuracy Soft Lithography,”Macromolecules, vol. 33, No. 8, pp. 3042-3049, The American Chemical Society (2000).
Sprenger, M. et al., “Hierarchical Pattern Replication by Polymer Demixing,”Advanced Materials, vol. 15, No. 9, pp. 703-706, Wiley-VCH Verlag GmbH & Co. (May 2003).
Velev, O.D. et al., “A Class of Microstructured Particles Through Colloidal Crystallization,”Science, vol. 287, No. 5461, pp. 2240-2243, The American Association for the Advancement of Science (2000).
Werts, M.H.V. et al., “Nonometer Scale Patterning of Langmuir-Blodgett Films of Gold Nanoparticles by Electron Beam Lithography,”Nano Letters, vol. 2, No. 1, pp. 43-47, The American Chemical Society (published on web 2001).
Winzer, M. et al., “Fabrication of nano-dot and nano-ring-arrays by nanosphere lithography,”Applied Physics A: Materials Science&Processing, vol. 63, pp. 617-619, Springer-Verlag (1996).
Wu, M.-H. and G.M. Whitesides, “Fabrication of arrays of two-dimensional micropatterns using microspheres as lenses for projection photolithography,”Applied Physics Letters, vol. 78, No. 16, pp. 2273-2275, The American Institute of Physics (2001).
Wu, W. et al., “Large area high density quantized magnetic disks fabricated using nanoimprint lithography,”Journal of Vacuum Science and Technology B, vol. 16, No. 6, pp. 3825-3829, The American Vacuum Society (1998).
Xia, Y. et al., “Non-Photolithographic Methods for Fabrication of Elastomeric Stamps for Use in Microcontact Printing,”Langmuir: The ACS Journal of Surfaces and Colloids, vol. 12, No. 16, pp. 4033-4038, The American Chemical Society (1996).
Xia, Y. and G.M. Whitesides, “Soft Lithography,”Angewandte Chemie, vol. 37, No. 5, pp. 551-575, Wiley-VCH Verlag GmbH (1998).
Yang, S.M. and G.A. Ozin, “Opal chips: vectorial growth of colloidal crystal patterns inside silicon wafers,”Chemical Communications, vol. 24, pp. 2507-2509, The Royal Society of Chemistry (2000).
Yi, D.K. and D.-Y. Kim, “Polymer nanosphere lithography: fabrication of an ordered trigonal polymeric nanostructure,”Chemical Communications, vol. 8, pp. 982-983, The Royal Society of Chemistry (published on web Mar. 2003).
Yi, G.-R. and S.-M. Yang, “Microstructure of Porous Silica Prepared in Aqueous and Nonaqueous Emulsion Templates,”Chemistry of Materials, vol. 11, No. 9, pp. 2322-2325, The Royal Society of Chemistry (1999).
Choi Dae-Geun
Jang Se Gyu
Yang Seung-Man
Chen Bret
Korea Advanced Institute of Science and Technology
Sterne Kessler Goldstein & Fox P.L.L.C.
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