Method of fabricating optical filters

Etching a substrate: processes – Forming or treating optical article

Reexamination Certificate

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Details

C216S002000, C216S041000, C216S083000, C385S014000, C359S350000

Reexamination Certificate

active

10871689

ABSTRACT:
A method of fabricating optical filter is disclosed. The method includes providing the substrate and selectively etching the substrate to form a plurality of freestanding layers. A plurality of dielectric layers is disposed over an outer surface of each of the freestanding layers. The resultant optical filters may be used in a variety of applications including etalon applications.

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