Plastic and nonmetallic article shaping or treating: processes – Mechanical shaping or molding to form or reform shaped article – Shaping against forming surface
Patent
1993-05-04
1994-08-02
King, Roy V.
Plastic and nonmetallic article shaping or treating: processes
Mechanical shaping or molding to form or reform shaped article
Shaping against forming surface
427249, 427122, 427309, 1563066, 1563082, 156652, 156653, 423446, B29C 3376, C23C 1622
Patent
active
053343425
ABSTRACT:
A high temperature resist process is combined with microlithographic patterning for the production of materials, such as diamond films, that require a high temperature deposition environment. For diamond films, a high temperature silicon nitride resist can be used for microlithographic patterning of a silicon substrate to provide a uniform distribution of diamond nucleation sites and to improve diamond film adhesion to the substrate. A fine-grained nucleation geometry, established at the nucleation sites, is maintained as the diamond film is deposited over the entire substrate after the silicon nitride resist is removed. The process can be extended to form surface relief features, such as "moth eye" surfaces, and microstructures of fine-grained polycrystalline diamond, such as rotatable microgears and surface relief patterns, that have the desirable characteristics of hardness, wear resistance, thermal conductivity, chemical inertness, anti-reflectance, and a low coefficient of friction.
REFERENCES:
patent: 4907846 (1990-03-01), Tustison et al.
patent: 5082359 (1992-01-01), Kirkpatrick
DeNatale Jeffrey F.
Flintoff John F.
Harker Alan B.
Hood Patrick J.
King Roy V.
McFarren John C.
Rockwell International Corporation
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