Method of fabricating MIM device arrays using a single exposure

Details Method of fabricating MIM device arrays using a single exposure Method of fabricating MIM device arrays using a single exposure

1992-04-16

1993-11-02

Sikes, William L.

Optical: systems and elements

Holographic system or element

Using a hologram as an optical element

359 62, 430 20, G02F 11335, C09K 1900

Patent

active

052588645

ABSTRACT:
A method of fabricating an array of MIM type devices together with associated address conductors and pad electrodes on a common support (11) suitable for use as a component in an active matrix display device, involves depositing a first, conductive, layer (30) and a second selectively etchable layer (31) in succession over the support, performing a photolithographic patterning process (35) to leave regions (32,33) of the layers determining eventual pad electrodes (25) and address conductors (28) with bridging portions (34), and thereafter performing further processing operations involving the deposition of further layers (36, 40, 41), including an insulating layer (40) and a further conductive layer (41), and the etching of particular layers, together with lift-off procedures, to define on the support an array of pad electrodes each connected to an address conductor through a MIM type device (10,45) at the region of the bridging portion. Advantageously, the method requires the use of only one conventional mask and a single exposure.

REFERENCES:
patent: 4396458 (1983-08-01), Platter et al.
patent: 4534623 (1985-08-01), Araki
patent: 4895789 (1990-01-01), Motte et al.

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