Etching a substrate: processes – Forming or treating thermal ink jet article
Reexamination Certificate
2006-05-23
2006-05-23
Hassanzadeh, Parviz (Department: 1763)
Etching a substrate: processes
Forming or treating thermal ink jet article
Reexamination Certificate
active
07048868
ABSTRACT:
A method of fabricating a micro-electromechanical inkjet nozzle on a wafer substrate is provided. The nozzle comprises a nozzle chamber having an aperture, an actuator positioned in the nozzle chamber for ejecting ink through the aperture, and control circuitry for controlling the actuator, the control circuitry being formed on the substrate. The method comprising the steps of: (a) carrying out an integrated circuit fabrication process on the wafer to form the control circuitry; (b) depositing first sacrificial material on the wafer; (c) forming the actuator on the first sacrificial layer such that the actuator electrically connects with the control circuitry; (d) depositing second sacrificial material over the actuator; (e) defining openings in the second sacrificial material, the openings being complementary with chamber sidewalls; (f) depositing roof material over the second sacrificial material and into the openings; (g) defining an aperture in the roof material; and (h) removing the first and second sacrificial materials.
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Culbert Roberts
Hassanzadeh Parviz
Silverbrook Reseach Pty Ltd
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