Method of fabricating liquid crystal display device

Details Method of fabricating liquid crystal display device Method of fabricating liquid crystal display device

2005-06-07

2005-06-07

Chowdhury, Tarifur R. (Department: 2871)

Liquid crystal cells, elements and systems

Nominal manufacturing methods or post manufacturing...

C349S043000, C345S092000, C257S072000

Reexamination Certificate

active

06903797

ABSTRACT:
Disclosed is a method of fabricating a liquid crystal display device enabling to form a uniform gate insulating layer in thickness. The present includes the steps of forming a gate line, a gate electrode, and a storage line on a substrate and forming a gate insulating layer on the substrate including the gate line and the gate electrode using first and second gases having a gas mixture ratio of 0.3˜0.5:1. And, the first and second gases are mono-silane(SiH4) and ammonia(NH3), respectively. Accordingly, the present invention enables a uniformly thick gate insulating layer, thereby to improving the discharging time as well as reducing flicker on the screen.

REFERENCES:
patent: 5276540 (1994-01-01), Okamoto et al.
patent: 5605846 (1997-02-01), Ohtani et al.
patent: 6274932 (2001-08-01), Mikagi
patent: 6355943 (2002-03-01), Sung

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