Method of fabricating liquid crystal display device

Details Method of fabricating liquid crystal display device Method of fabricating liquid crystal display device

2005-09-27

2005-09-27

Wilczewski, M. (Department: 2822)

Semiconductor device manufacturing: process

Making device or circuit emissive of nonelectrical signal

Including integrally formed optical element

C438S059000

Reexamination Certificate

active

06949390

ABSTRACT:
A method for forming a display device, includes forming a thin film transistor (TFT), a gate pad and a data pad on a substrate; depositing sequentially an inorganic insulating material and an organic insulating material on the substrate having the TFT, the gate pad and the data pad; selectively removing the organic insulating material using a diffracting mask to form a patterned organic insulating layer; selectively removing the inorganic insulating material, using at least a portion of the patterned organic insulating layer as a mask to define contact holes for the TFT, the gate pad and the data pad; and forming electrodes in the contact holes.

REFERENCES:
patent: 5905555 (1999-05-01), Yamazaki et al.
patent: 6104461 (2000-08-01), Zhang et al.
patent: 6160600 (2000-12-01), Yamazaki et al.
patent: 6335276 (2002-01-01), Park et al.
patent: 2001/0007779 (2001-07-01), Lee et al.
patent: 2001/0041394 (2001-11-01), Park et al.
patent: 2002/0074549 (2002-06-01), Park et al.

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