Semiconductor device manufacturing: process – Making device or circuit emissive of nonelectrical signal – Including integrally formed optical element
Reexamination Certificate
2007-02-20
2007-02-20
Pham, Long (Department: 2814)
Semiconductor device manufacturing: process
Making device or circuit emissive of nonelectrical signal
Including integrally formed optical element
C438S038000, C257S059000, C257S072000, C349S190000, C349S189000, C349S153000
Reexamination Certificate
active
10690573
ABSTRACT:
A method of fabricating a liquid crystal display device is disclosed in the present invention. The method includes forming a thin film transistor in a pixel region and a pad on an edge region of a first substrate, depositing an organic passivation layer over the first substrate, and removing the organic passivation layer in the edge region using a diffraction mask to expose a portion of the pad, wherein the diffraction mask has a slit portion including a plurality of slits having different widths.
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Ryu Ho-Jin
Song In-Duk
LG.Philips LCD Co. , Ltd.
Morgan & Lewis & Bockius, LLP
Pham Long
Rao Shrinivas
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