Coating processes – Heat decomposition of applied coating or base material – Coating decomposed to form metal
Reexamination Certificate
2007-06-05
2007-06-05
Talbot, Brian K. (Department: 1762)
Coating processes
Heat decomposition of applied coating or base material
Coating decomposed to form metal
C427S058000, C427S079000, C427S255280
Reexamination Certificate
active
10008980
ABSTRACT:
A method of forming an iridium-containing film on a substrate, from an iridium-containing precursor thereof which is decomposable to deposit iridium on the substrate, by decomposing the precursor and depositing iridium on the substrate in an oxidizing ambient environment which may for example contain an oxidizing gas such as oxygen, ozone, air, and nitrogen oxide. Useful precursors include Lewis base stabilized Ir(I)β-diketonates and Lewis base stabilized Ir(I) β-ketoiminates. The iridium deposited on the substrate may then be etched for patterning an electrode, followed by depositing on the electrode a dielectric or ferroelectric material, for fabrication of thin film capacitor semiconductor devices such as DRAMs, FRAMs, hybrid systems, smart cards and communication systems.
REFERENCES:
patent: 5096737 (1992-03-01), Baum et al.
patent: 5130172 (1992-07-01), Hicks et al.
patent: 5204314 (1993-04-01), Kirlin et al.
patent: 5403620 (1995-04-01), Kaesz et al.
patent: 5536323 (1996-07-01), Kirlin et al.
patent: 5695815 (1997-12-01), Vaartstra
patent: 5763633 (1998-06-01), Vaartstra
patent: 5840897 (1998-11-01), Kirlin et al.
patent: 5874364 (1999-02-01), Nakabayashi et al.
patent: 6018065 (2000-01-01), Baum et al.
patent: 6143191 (2000-11-01), Baum et al.
patent: 6271077 (2001-08-01), Nakabayashi et al.
patent: 6340769 (2002-01-01), Baum et al.
Leipoldt. et al., “Kinetics of the Substitution Reactions of β-Diketonato-1,5-cyclo octadieneiridium(1) Complexes with Derivatives of 1. 10-Phenanthroline and 2.2′-Dipyridyl.” Journal of Organometallic Chemistry, 418, (1991), pp. 241-247.
Basson, et al., “Bromide Catalysts in the Oxidative Addition of Iodomethane to Iridium(I) Complexes,” Inoraganica Chimica Acta. 173 (1990) pp. 155-158.
JP08-260148 A (Oct. 8, 1996), col. 2 lines 10-20, col. 6, lines 30-50, Figure (Abstract in English).
Brouwers et al., “Photochemistry of acetylacetanato-, trifluoroacetylacetanato-, and hexafluoroacetyl-acetanato-dicarbonylrhhodium and iridium complexes in frozen gas mixtures at 12K.” J. Chem. Soc., Dalton Trans. (1982), (9), 1777-82.
Hitchcock et al., Fluorophosphine Complexes of Rhodium(I) and Iridium(I), J. Chem. Soc. Dalton Trans. (Jul. 1985). pp. 1295-1301, especially p. 129.
Gertin et al. Growth of Iridium Films by Metal Organic Chemical Vapor Deposition. Thin Solid Films. (Apr. 1994), pp. 352-355.
Advanced Inorganic Chemistry by Cotton and Wilkinson, pp. 772.
Cho, H.J. et al., “Preparation and Characterization of Iridium Oxide Thin Films by DC Reactive Sputtering” Extended Abstracts of the 1996 International Conference on Solid State Devices and Materials, Yokohama, (1996). pp. 721-723.
Chen, Tung-Sheng, “Ir-Electroded BST Thin Film Capacitors for 1 Giga-bit DRAM Application”, IEEE (1996) pp. 27.2.1-27.2.4.
Nakamura, Takashi et al., “Preparation of Pb(Zr,Ti)O3Thin Films on Ir and IrO2Electrodes” Jpn. J. Appl. Phys., Part 1, No. 9B, vol. 33 (1994), pp. 5211-5214.
Chen, Tung-Sheng, “Stability of Reactive DC Sputtered Ir and IrO2Thin Films in Various Ambients”, Integrated Ferroelectrics, vol. 16 (1997), pp. 191-198.
Hoke, J.B., Stern, E.W., Murray, H.H.,J. Mater. Chem., 1(4), 551-554 (1991).
Papke, J.A., Stevenson, R.D.,Proc. Conf. Chem. Vapor Dep. of Refractory Metals, Alloys and Compounds, Gatlinburg, Tennessee, 193-204 (1967).
Baum Thomas H.
Xu Chongying
Advanced Technology & Materials Inc.
Chappuis Maggie
Hultquist Steven J.
Intellectual Property / Technology Law
Talbot Brian K.
LandOfFree
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