Method of fabricating implantation mask

Details Method of fabricating implantation mask Method of fabricating implantation mask

1998-08-19

2000-10-10

Young, Christopher G.

Radiation imagery chemistry: process, composition, or product th

Radiation modifying product or process of making

Radiation mask

430314, 430315, 430324, G03C 500

Patent

active

06130011&

ABSTRACT:
A method of fabricating a deep UV implantation mask. A deep UV photo-resist layer is formed on a substrate. The deep UV photo-resist layer is defined to cover a part of the substrate. A silylation process is performed to transform the surface of the deep UV photo-resist layer into a hard mask layer. Using the hard mask layer as a mask, the substrate is implanted with ions.

REFERENCES:
patent: 5139925 (1992-08-01), Hartney
patent: 5318870 (1994-06-01), Hartney
patent: 5362606 (1994-11-01), Hartney et al.
patent: 5366852 (1994-11-01), Pavelchek et al.
patent: 5550007 (1996-08-01), Taylor et al.
patent: 5707783 (1998-01-01), Stauffer et al.

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