Method of fabricating hybrid uncooled infrared detectors

Details Method of fabricating hybrid uncooled infrared detectors Method of fabricating hybrid uncooled infrared detectors

1995-03-29

1997-06-17

Arbes, Carl J.

Metal working

Method of mechanical manufacture

Electrical device making

250332, 2503381, 2503383, 216 13, 216 24, H01R 900

Patent

active

056385994

ABSTRACT:
Thermal isolation mesas 36 comprising a porous material 64 are used to thermally insulate sensing integrated circuitry 44 from pixels 34 of an uncooled IR detector hybrid system 30. The porous material 64 is preferably a silicon-dioxide xerogel. The mesas 36 may also comprise a protective film 66.

REFERENCES:
patent: 4080532 (1978-03-01), Hopper
patent: 4740700 (1988-04-01), Shaham et al.
patent: 4745278 (1988-05-01), Hanson
patent: 4792681 (1988-12-01), Hanson
patent: 5235195 (1993-08-01), Tran et al.
patent: 5424544 (1995-06-01), Shelton et al.
patent: 5426303 (1995-06-01), Owen et al.
patent: 5426304 (1995-06-01), Belcher et al.
patent: 5436450 (1995-07-01), Belcher et al.
patent: 5457318 (1995-10-01), Robinson et al.
patent: 5472913 (1995-12-01), Havemann et al.
patent: 5478242 (1995-12-01), Walker et al.
Processing & Characterization of High Porosity Aerogel Films by L.W. Hrubesh et al. which appears in Mat Res. Soc Symp Proc vol. 371 .COPYRGT.1995 Materials Research Society.
Hanson, et al., "Low-Cost Uncooled Focal Plane Array Technology", Presented at Detector IRIS Meeting, Bedford, MA: by Defense Systems and Electronics Group; Aug. 17, 1993, pp. 1-9.

Affiliated with

Also associated with

Rating

Method of fabricating hybrid uncooled infrared detectors does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Method of fabricating hybrid uncooled infrared detectors, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Method of fabricating hybrid uncooled infrared detectors will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-2150667