Method of fabricating halftone phase shift mask

Radiation imagery chemistry: process – composition – or product th – Radiation modifying product or process of making – Radiation mask

Reexamination Certificate

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C430S322000

Reexamination Certificate

active

07932001

ABSTRACT:
A method of fabricating a halftone phase shift mask, comprising: forming a structure by sequentially stacking a light blocking layer pattern defining a side surface and a phase shift layer pattern over a light transmitting substrate; and treating the structure with heat to make the phase shift layer pattern flow and cover the side surface of the light blocking layer pattern.

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patent: 5538816 (1996-07-01), Hashimoto et al.
patent: 5738959 (1998-04-01), Miyashita et al.
patent: 5916712 (1999-06-01), Miyashita et al.
patent: 2006/0257752 (2006-11-01), Kim et al.
patent: 2002-156764 (2002-05-01), None
patent: 10-1996-0015788 (1996-11-01), None
patent: 10-2007-0100572 (2007-10-01), None

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