Method of fabricating focusing and color-filtering structure for

Details Method of fabricating focusing and color-filtering structure for Method of fabricating focusing and color-filtering structure for

1998-08-24

2000-10-17

Fourson, George

Semiconductor device manufacturing: process

Making device or circuit responsive to nonelectrical signal

Responsive to electromagnetic radiation

438697, H01L 2131

Patent

active

061330620

ABSTRACT:
An improved focusing and color-filtering structure is provided for use in a semiconductor light-sensitive device, such as CMOS (complementary metal-oxide semiconductor) light-sensitive device, that can be used, for example, on a digital camera or a PC camera to convert photographed image directly into digital form. The focusing and color-filtering structure is used for the focusing and color-filtering of the light incident thereon prior to the light being detected by the light-sensitive device. The focusing and color-filtering structure is characterized in the forming of a dummy pattern layer in the non-filter area surrounding the array of color-filter layers, which allows the subsequently formed planarization layer to be highly planarization with a substantially uniformly flat top surface without having slopes such that the subsequently formed microlenses can all be disposed upright in position without being slanted. The focusing and color-filtering structure has the benefit of allowing the quality of the photographed image to be more assured without being degraded by the ambient scatting light as in the prior art.

REFERENCES:
patent: 5256592 (1993-10-01), Matsushita
patent: 5426058 (1995-06-01), Nakai et al.
patent: 5965939 (1999-10-01), Kim et al.

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