Method of fabricating flat type electrochemical device

Details Method of fabricating flat type electrochemical device Method of fabricating flat type electrochemical device

1992-07-27

1994-01-18

Hearn, Brian E.

Metal working

Barrier layer or semiconductor device making

Barrier layer device making

29 2502, 29 2542, 437209, 437217, 437220, H01L 2152

Patent

active

052796230

ABSTRACT:
A method of fabricating a flat type electrochemical device, which is constructed by placing in a case comprising first and second case half bodies a separator and first and second functional substances for an electrochemical device so arranged as to interpose the separator. Peripheral portions of the first and second case half bodies are overlapped with each other, the peripheral portions are welded by a welding process during the application of pressure whereby the peripheral portions are joined with substantially no gaps. The portions welded by the welding process with pressure are then further welded using a laser beam welding.

REFERENCES:
patent: 4594770 (1986-06-01), Butt
patent: 4597028 (1986-06-01), Yoshida et al.
patent: 4748537 (1988-05-01), Hernandez et al.
patent: 4920641 (1990-05-01), Nakamura
patent: 5040091 (1991-08-01), Yamaoka et al.
patent: 5139972 (1992-08-01), Neugebauer et al.

Affiliated with

Also associated with

Rating

Method of fabricating flat type electrochemical device does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Method of fabricating flat type electrochemical device, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Method of fabricating flat type electrochemical device will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-1133478