Method of fabricating electronic component using resist...

Details Method of fabricating electronic component using resist... Method of fabricating electronic component using resist...

2008-01-29

2008-01-29

Culbert, Roberts (Department: 1763)

Etching a substrate: processes

Forming or treating article containing magnetically...

Reexamination Certificate

active

07323112

ABSTRACT:
A method for milling a structure. A single- or multi-layer resist having no undercut is added to a surface of a structure to be milled, the surface to be milled defining a plane. A milling process, such as ion milling, is performed. The milling process includes milling the structure at high incidence and milling the structure at razing incidence. The milling process can be performed only once, or repeated multiple times. High incidence can be defined as about 65 to about 90 degrees from the plane of the surface being milled. Razing incidence can be defined as about 0 to about 30 degrees from the plane of the surface being milled.

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Office Action from U.S. Appl. No. 11/200,757 mailed Jun. 4, 2007.

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