Method of fabricating backside illuminated FET optical receiver

Details Method of fabricating backside illuminated FET optical receiver Method of fabricating backside illuminated FET optical receiver

1994-07-14

1997-09-02

Wilczewski, Mary

Semiconductor device manufacturing: process

Making device or circuit responsive to nonelectrical signal

Responsive to electromagnetic radiation

438 64, 438571, 438980, 438977, 438118, 438 94, H01L 3118, H01L 21265, H01L 21203, H01L 2120

Patent

active

056630751

ABSTRACT:
A photo FET device having a large area backside optical energy reception surface is disclosed. The photo FET device is fabricated in the source gate and drain upward configuration and then inverted onto a new permanent substrate member and an original surrogate substrate member removed in order to expose the active area backside optical energy reception surface. Electrical characteristics including curve tracer electrical data originating in both dark and illuminated devices and devices of varying size and both depletion mode and enhancement mode operation are also disclosed. Fabrication of the device from gallium arsenide semiconductor material and utilization for infrared energy transducing in a number of differing electronic applications are also disclosed.

REFERENCES:
patent: 4321613 (1982-03-01), Hughes et al.
patent: 5008213 (1991-04-01), Kolesar, Jr.
patent: 5180681 (1993-01-01), Mishra et al.
patent: 5204278 (1993-04-01), Imamura et al.
patent: 5356823 (1994-10-01), Mitani

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