Etching a substrate: processes – Forming or treating article containing a liquid crystal...
Reexamination Certificate
2006-04-11
2008-12-09
Ahmed, Shamim (Department: 1792)
Etching a substrate: processes
Forming or treating article containing a liquid crystal...
C216S041000, C216S058000, C216S083000, C438S149000, C438S689000, C438S706000
Reexamination Certificate
active
07462291
ABSTRACT:
A method of fabricating an array substrate for a liquid crystal display device is provided. The method includes steps of forming an amorphous silicon pattern on a substrate; forming a catalyst metal pattern on the amorphous silicon pattern; annealing the amorphous silicon pattern to be converted into a polycrystalline silicon pattern using the catalyst metal pattern as a catalyst; forming a gate insulating layer on the polycrystalline silicon pattern; forming a gate electrode on the gate insulation layer at a position corresponding to the polycrystalline silicon pattern; doping the polycrystalline silicon pattern with impurities using the gate electrode as a doping mask to form an ohmic contact layer and an active layer; forming an interlayer insulating layer having first and second contact holes on the gate electrode, the first and second contact holes exposing portions of the ohmic contact layer; and forming a source electrode and a drain electrode on the interlayer insulating layer, the source electrode and the drain electrode connected to the ohmic contact layer respectively through the first and second contact holes.
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Ahmed Shamim
LG Display Co. Ltd.
Morgan & Lewis & Bockius, LLP
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